This sapphire CMP polishing slurry adopts nano silica as abrasive, with uniform particle size and excellent dispersion stability, low sedimentation. It is designed for CMP polishing of sapphire substrates, optical windows, camera lenses and sapphire watch covers. It delivers low surface roughness, few scratches and high mirror finish. Easy to clean. Compatible with various polishing machines. Custom particle size & solid content are available. Factory direct supply, samples are acceptable.